Abstract
The results of studies performed by the authors in the field of ion enhancement of various processes on the solid surface were generalized. The effect of ion irradiation on the kinetics of elementary processes during thin film formation was analyzed. Systematic features of ion enhancement of film formation on a metal and ionic crystal surface were studied. The effect of ion enhancement of epitaxy on the ionic crystal surface was revealed and the observed features were explained. An important role of inelastic ion-atom interactions in the effect of ion enhancement of surface processes was shown, and their features were investigated. It was found that the efficiency of ion enhancement on the ionic crystal surface under conditions of inelastic interactions can be increased by one or two orders of magnitude in comparison with the yield of elastic processes. Inelastic ion-atom interactions at low ion energies occur in selective energy ranges, nonmonotonically depend on the current density, and require a selective approach to the choice of the ion type and ion irradiation parameters.
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