Abstract

In this paper, the authors report values of ion energy distributions and ion angular distributions measured at the grounded electrode of an inductively-coupled discharge in pure chlorine gas. The inductive drive in the GEC reference cell produced high plasma densities (10{sup 11}/cm{sup 3} electron densities) and stable plasma potentials. As a result, ion energy distributions typically consisted of a single peak well separated from zero energy. Mean ion energy varied inversely with pressure, decreasing from 13 to 9 eV as the discharge pressure increased from 20 to 60 millitorr. Half-widths of the ion angular distributions in these experiments varied from 6 to 7.5 degrees, corresponding to transverse energies from 0.13 to 0.21 eV. Ion energies gradually dropped with time, probably due to the buildup of contaminants on the chamber walls. Cell temperature also was an important variable, with ion fluxes to the lower electrode increasing and the ion angular distribution narrowing as the cell temperature increased. Plasmas discharges are widely used to etch semiconductors, oxides and metals in the fabrication of integrated circuits.

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