Abstract
To meet the challenging performance requirements of next generation high current ion implanters, several new technologies have been developed for the ion beam system of the new Varian high current ion implanter, Extrion-1000. A novel strong focussing accel/decel scheme with a new ion source guarantees high beam output even down to very low energies. Its multiple crucible vaporizer is based on a new concept and allows easy maintenance, longer lifetime, improved time response and rapid species change. Great care was taken in the design of the vacuum system to provide appropriately low pressures at critical points ensuring high beam purity and high dosimetry accuracy.
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Schedule a callMore From: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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