Ion beam processing for coating MgF_2 onto ambient temperature substrates

Abstract

In this paper, we report on the use of inert gas ion bombardment during the deposition of MgF2 films on ambient temperature substrates. The low energy (<250-eV/ion) bombardment is shown to increase significantly the abrasion resistance and adherence of the films without significantly degrading their optical performance. The success of this technique has wide-ranging implications for the application of durable coatings to temperature sensitive substrates.