Film growth

Abstract

The chapter reviews the properties of thin films deposited by cathodic arc evaporation. The cathodic arc evaporation method is a high rate practical technique for the deposition of elemental films and the synthesis of compound ceramic materials. The properties of the films can be controlled by the energy of the depositing ions from the cathode by the application of appropriate negative potentials to the substrate. The materials range from metals through oxides and nitrides to diamond-like carbon. The chapter discusses metal film deposition, oxide deposition, nitrides, and carbides. Hard wear-resistant TiN coatings with good optical properties are readily deposited and the properties may be further enhanced by the addition of other elements. The reduction of macroparticles from the deposited films has also enabled the growth of diamond-like carbon films onto ambient temperature substrates. Progress has also been made in the deposition of both high and low temperature superconducting materials. The cathodic arc deposition method is an evolving technique which complements electron beam and sputtering technology and offers some distinct advantages in the growth of both elemental and compound thin film materials.