Abstract
Ion beam microfabrication technology plays increasingly important roles for VLSI, ULSI or future quantum effect devices fabrication because of its unique characteristics and has wide applications including etching, deposition, doping, materials synthesis and modification and lithography. For etching, techniques with atomic-scale precision and minimal damage induction are required. In this paper, the importance of low-energy ion beams and characteristics of new etching techniques, such as digital etching, are discussed.
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