Abstract
Various papers from 1987 to the present have reported efforts to deposit MgF2 at low temperatures with less than satisfactory results. Process parameters have been developed here for magnesium fluoride coatings which can be deposited without process heat and meet the same performance as is usually achieved in a 300 °C process. Such films on BK7 glass have an index of refraction in excess of 1.39 at 550 nm without significant absorption or scattering and pass the usual mil-spec eraser-rub hardness/abrasion test. Design of Experiments Methodology has been used to find the ion assisted deposition parameters suitable for the Veeco Mark-II ion source using nitrogen as the working gas in a chamber with a 2500 L/s pumping speed. The topology of the surface has been investigated with AFM measurement. Also, the images of some samples have been taken by microscope. AFM and microscope images are analyzed. The scattering of samples are attributed more to cracks on the surfaces than roughness.
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