(Invited) Study on Rram Properties Using Resistive Switching Layer with ZnO Nanostructure

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Zinc oxide (ZnO) is an amorphous oxide semiconductor (AOS) material valued for its high carrier mobility, transparency to visible light, and low-temperature manufacturing process compared to silicon-based semiconductors. These desired features make ZnO-based AOSs widely popular as the channel layer in TFTs and as key dielectric layers in electronic devices like light sensors, gas detectors, resistive random-access memory (RRAM), and more. Among them, Conductive Bridge Random Access Memory (CBRAM) with a dielectric switching layer sandwiched between the electrochemically active metal (Ag, Cu) top electrode and the inert bottom electrode, is of a class of RRAM that offers low-voltage operation, high-density storage device, non-volatile, and compatibility with standard CMOS processes [1]. The CBRAM operates based on the principle of conductive filament formation and rupture. During operation, conductive filaments will be formed in switching layer by connecting metal ions which diffuse from the electrode after applying a positive bias. The device will switch to a low resistance state (LRS) after the conductive filaments were formed. After this, applying a negative bias will break the conductive filaments and switch the device back to a high resistance state (HRS). The HRS and LRS are the 0 or1 state of the memory operation. Studies and works have shown that controlling the distribution and diffusion of electrode metal ions in the switching layer is challenging because the conductive filaments formed can vary significantly in strength, ranging from robust to fragile [2]. This leads to instability in the operation of memory devices and encountering difficulties in the integration with TFT pixel array for memory-in-pixel (MiP) power-saving displays [3] or CMOS-integrated compute-in-memory applications [4].In this work, we proposed a novel CBRAM device featuring ZnO nanostructures as the resistive switching layer. The combination of a sputter-deposited seed layer with the water bath method enables the production of high-quality ZnO nanostructures at temperatures below 90°C. These nanostructures play a crucial role in constraining metal ion diffusion and filament formation, leading to the formation of uniform conductive filaments. This improvement significantly enhances the operational stability of the CBRAM device. The experimental results have demonstrated superior memory characteristics with a highly uniform distribution achieved successfully in the ZnO nanostructure-embedded CBRAM, compared to its counterpart lacking ZnO nanostructures. Furthermore, post-treatments are implemented in this study to further promote electrical performance of the nanostructure-embedded CBRAM, like operation voltage, memory window, retention, and endurance. Reference: [1] C. Gopalan, Y. Ma, T. Gallo, J. Wang, E. Runnion, J. Saenz, F. Koushan, P. Blanchard, S. Hollmer, “Demonstration of Conductive Bridging Random Access Memory (CBRAM) in logic CMOS process”, Solid-State Electronics, vol. 58 (1), p. 54-61, 2011.[2] C. C. Hsu, P. T. Liu, K. J. Gan, D. B. Ruan, Simon M. Sze, “Investigation of deposition technique and thickness effect of HfO2 film in bilayer InWZnO-based conductive bridge random access memory”, Vacuum, vol. 201, 111123, 2022.[3] S. H. Lee, B. C. Yu, H. J. Chung, and S. W. Lee, “Memory-in-pixel circuit for low-power liquid crystal displays comprising oxide thin-filmtransistors,” IEEE Electron Device Lett., vol. 11 (11), pp. 1551–1554, 2017.[4] W. Wan, R. Kubendran, C. Schaefer, et al., “A compute-in-memory chip based on resistive random-access memory”, Nature, vol. 608, p. 504–512, 2022.