Abstract
We propose a research topic to comprehensively understand the intrinsic unipolar SiOx-based resistive-switching random-access memory (ReRAM) characteristics and mechanisms that can provide deep insights of device design and performance improvement for next-generation nonvolatile memory applications, as required for low-power portable electronics, highly-integrated of compact memory design, and other applications. Several main research targets will be pursued. Firstly, we will investigate device structures, material compositions and electrical characteristics to realize ReRAM cells with high ON/OFF ratio, low static power consumption, low switching power, and high readout-margin using CMOS compatible SiOx-based materials in both metal-insulator-semiconductor (MIS) and metal-insulator-metal (MIM), and one diode - one resistive switching element (1D-1R) architectures. These ideas will be combined with the use of horizontal and vertical device structure designs (active device size and thickness), composition optimization (SiOx, x < 2), electrical controlling (compliance current limitation, stopped voltage sweeping, and polarity effect) and external factors (series-resistance and ambient effects) for understanding and characterizations of resistive switching mechanism. Secondly, modeling of resistive switching mechanism, including temperature effect, pulse response and carrier transport behaviors will be performed, to develop a compact model in energy diagram, trap-level information, dipole polarization in SiOx resistive switching layer, even for computer-aided design (CAD) in very-large-scale integration (VLSI) design. Finally, for the first time, an intriguing non-Von Neumann computing architecture, named synapse-based neuromorphic system, will be demonstrated in SiOx-based ReRAM, combining with bio-inspiration and biomimetics process illustrations. The novel applications in the physiology and pathology discussions in reactive oxygen species (ROS) production and regulation processes will be clarified. This work will present the comprehensively investigation of SiOx-based resistive switching characteristics, mechanisms, applications for future post-CMOS devices era.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
