(Invited) Ferroelectric Thin-Film Transistors for Memory and Neuromorphic Device Applications

Abstract

Listen

Translate article

Ferroelectric materials boast a remarkable ability to maintain polarization states independently of external electric fields. This unique trait makes them ideal candidates for manipulating polarization through applied electric fields, effectively influencing the domains within these materials. By modulating polarization states, we gain precise control over channel conductance, rendering ferroelectric materials highly suitable for integration as gate dielectric layers in transistors. The incorporation of ferroelectric layers into transistors enables the regulation of channel conductance, empowering precise control over a device's electrical properties. Consequently, this enhances their effectiveness as memory elements. This innovative approach not only drives the development of high-density memory devices but also bestows ferroelectric transistors with analog memory characteristics. This quality significantly broadens their potential applications, particularly in neuromorphic devices striving to emulate the complexities of biological neural networks. In summary, ferroelectric transistors represent a promising frontier in memory technology, offering not only high-density memory solutions but also the potential to revolutionize the field of neuromorphic computing. This presentation explores these compelling prospects, detailing strategies to fully exploit the capabilities of ferroelectric materials in memory and computational applications.