Abstract
With the advent of 2D materials, the playground to study spins in dilute and non-dilute phases has expanded. This is appealing for utilizing the additional degrees of freedom of electron systems such as spin and valley and, from the fundamental point of view, to better understand atomic scale magnetic phenomena in low dimensional materials. Dilute magnetism in 2D materials can lead to complex magnetic phenomena (e.g., Kondo effect, RKKY-interactions, quantum relaxation and coherence), with potential for applications in spintronics (e.g., spin FETs) and quantum technologies (e.g., single-atom quantum memories). We are investigating how to selectively incorporate substitutional magnetic atoms (3d transition metals and 4f rare earths) in 2D materials, using ultra low energy ion implantation, and we characterize their structural, electronic, and magnetic properties [1]. Ultra-low energy (ULE) ion implantation allows us to precisely tune the kinetic energy of the ions, providing control over the form of incorporation and concentration while preserving the structural and electronic properties of graphene. Our approach is based on a wide range of characterization techniques (structural and electronic), including scanning tunneling microscopy and spectroscopy (STM/STS), Raman spectroscopy, synchrotron-based X-ray photoelectron spectroscopy (XPS), angle-resolved photoemission spectroscopy (ARPES), X-ray magnetic circular dichroism (XMCD), among others. These experimental studies are complemented by density functional theory (DFT) and molecular dynamics (MD) simulations. The new insights provided by our work establish a framework for the controlled incorporation of magnetic dopants in 2D materials, using ULE ion implantation.[1] P. C. Lin et al., ACS Nano 15(3), 5449-5458 (2021).
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