(Invited) Advanced III-V-on-Si Heterogeneously Integrated Platforms for Next Generation Silicon Photonics Integrated Circuits

Abstract

The field of Silicon Photonics has experienced a solid and continuous progress over the last few years, gaining in technological maturity, design tools, and new methods [1]. The deployment of low-cost, compact, and power-efficient photonic circuits with a high wafer yield and robustness stands as one of the fundamental pillars that sustain such progress [2]. Presently, photonic circuit technology has diversified its number of available platforms. Despite the fact that indium phosphide (InP) [3] and silicon-on-insulator (SOI) platforms are still considered as the workhorses of integrated photonics in terms of maturity and deployment of active (InP) and passive (SOI) components, other alternatives such as germanium-on-silicon [4], silicon nitride-on-insulator [2] or hybrid solutions combining different functional materials with Si are gaining momentum [5]. A representative example is the heterogeneous III-V/Si platform [6], which has been used to develop compact photonic circuits with on-chip gain. Contrarily to the hybrid integration, the III-V-on-Si heterogeneous integration avoids the constraints of chip-to-chip alignment while enabling the simultaneous integration of hundreds of III-V gain chips in a scalable fashion. Still, the integration methods of such III-V materials on silicon need to be improved to attain the maturity level of the monolithic III-V platform, which benefits from a complete palette of technological solutions not yet available in the III-V-on-Si heterogeneous integration. More recently, an advanced heterogeneous scheme based on wafer-seed-bonding and epitaxial regrowth has emerged [7]–[9]. The ambition is to create a generic integration scheme combining the best offered by the III-V and the Si-photonics platforms. The regrowth capability gives access to the large epitaxial toolkit available in the conventional InP monolithic platform, where several epitaxial steps are often implemented [10][11]. To cite some of them, the epitaxial regrowth of III-V materials to bury III-V lasers bonded onto silicon are object of intense research nowadays to overcome the thermally inefficient buried oxide [12].In this paper, we will review the advances on III-V-on-Si heterogeneous integration through the implementation of several key demonstrators and building blocks for silicon photonics, including on-chip semiconductor optical amplifiers, lasers and electro-absorption modulators. We will discuss the progress and benefits of the direct seed bonding and regrowth as well as new device designs to improve the performance.