Abstract
AES and XPS techniques are used to study the chemical behaviour of a vapour deposited barium layer before, during and after exposure to common residual gases in a picture tube and to electrons under conditions that closely resemble those of a barium getter in electronic vacuum devices. Measurement of the surface composition of the barium layer by these techniques during exposure provide data on the kinetics of the reaction with these gases. The XPS spectra of O 1s and C 1s are used to distinguish between oxide, hydroxide, carbide and carbonate formation. Investigations on the higher order reactions of the barium film with residual gases reveal remarkable differences between the two techniques, primarily due to electron bombardment effects. Thin Ba(OH) 2 and BaCO 3 films are found to change in chemical composition for electron doses (at 2 keV) as low as 2 × 10 -3 C/cm 2 and 2 × 10 -2 C/cm 2, respectively.
Published Version
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