Abstract
The nanocrystal Ti and Zr films were prepared by dc magnetron sputtering method on a liquid N 2 cooled copper substrate using Ti and Zr metal targets, respectively. The grain size of the Ti and Zr films is in the range of 5 - 12 nm, determined by both TEM observation and x- ray diffraction patterns using Warren-Averbach analysis. The structure anomaly for Ti and Zr films are found by means of electron diffraction as well as x-ray diffraction. The results of x- ray diffraction show that they are typical bcc structure for Ti films, which appears only at high temperature (more than 885 degree(s)C). The tattice parameter is 0.33178 nm close to that of the diffraction data extended from Ta-Ti alloys (JCPDS-5-628). For Zr nanocrystal films, the x-ray diffraction patterns show that it is (omega) -phase which appears only at high pressure above 39 kbar.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call