Abstract
The artificial material sitall CO-115M was developed purposely as a material with an extra-low thermal expansion. The controlled crystallization of an aluminosilicate glass melt leads to the formation of a mixture of β-spodumen, β-eucryptite, and β-silica anisotropic microcrystals in a matrix of residual glass. Due to the small size of the microcrystals, the material is homogeneous and transparent. Specific lattice anharmonism of these microcrystal materials results in close to zero average thermal linear expansion coefficient (TLEC) of the sitall material. The thermal expansion coefficient of this material was measured using an interferometric method in line with the classical approach of Fizeau. To obtain the highest accuracy, the registration of light intensity of the total interference field was used. Then, the parameters of the interference pattern were calculated. Due to the large amount of information in the interference pattern, the error of the calculated fringe position was less than the size of a pixel of the optical registration system. The thermal expansion coefficient of the sitall CO-115M and its temperature dependence were measured. The TLEC value of about 3 × 10−8 K−1 to 5 × 10−8 K−1 in the temperature interval from −20 °C to +60 °C was obtained. A special investigation was carried out to show the homogeneity of the material.
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