Abstract
We studied the morphology of ramps in YBa2Cu3O7-δ films and, subsequently, the barrier layer. The ramps have beenfabricated by Ar ion beam milling using standard photoresist masks. SEM andAFM showed the formation of tracks along the slope of the ramp, originatingfrom the irregular shape of the edge of the photoresist mask. A proposedmodified reflowed resist and pre-annealing process show a significantly smootherramp surface, important for the fabrication of reproducible Josephson junctions.
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