Abstract
The coatings were obtained by pulsed magnetron sputtering of Ta5Si3-TaN-Si3N4 target. Reverse pulse duration was varied during deposition. The structure, composition, mechanical characteristics and oxidation resistance have been investigated. It was found that an increase in the pulse duration does not significantly affect the structure and hardness of the coatings but control the growth rate and nitrogen content in the coatings. Ta-Si-N coatings showed high hardness in range of 20-22 GPa and good oxidation resistance up to 800 °C.
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