Abstract
Un-doped and lithium (2, 4 and 6) M% doped copper oxide (CuO) thin films were deposited on a glass substrate using successive ionic layer adsorption and reaction (SILAR) method. Structural, surface morphology, optical and photoluminescence characteristics of un-doped and Li- doped CuO thin films were investigated with respect to Li content. The x-ray diffraction (XRD) results showed that the crystal structure of the deposited films was polycrystalline in nature with monoclinic phase. The average crystallite size of un-doped CuO films was 35.31 nm and decreased to 21.17 nm and 17.65 nm as the lithium dopant content increased to (2 and 6) M%, while the crystallite size was increased to 42.37 nm when Li content 4 M%. The EDX spectra confirmed the existence of the elements of the films. The transmittance of CuO films was decrease from 64% to 50% with increasing of Li dopant content. The values of optical band gap was observed to be at (1.77, 1.65, 1.58 and 1.62) eV with respect to (0, 2, 4 and 6) M% of Lithium dopant concentration. The Photoluminescence spectra reveal that the near band gap emission (NBE) peak is in the visible region at around 690 nm (1.797 eV) that corresponds to the red emission. The Li-doped films did not exhibit any new emissions whereas there is a noticeable decrement in the intensities of the peaks with the increase of Li-dopant concentration.
Published Version
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