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Abstract
A one-dimensional fluid sheath model is developed for describing the charging effects with secondary electron emission during plasma immersion ion implantation with dielectric substrates. The temporal evolution of the sheath thickness, surface potential of dielectric substrates and the charge dose accumulated on the surface of dielectric substrates are calculated with the model. The numerical results demonstrate that secondary electron emission effects increase the charging effects greatly, so the sheath thickness becomes thinner and the surface potential of dielectric decreases fast.
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