Effects of dielectric substrate thickness on plasma immersion ion implantation

Abstract

A one-dimensional plasma fluid model is developed for investigating the effects of dielectric substrate thickness on plasma immersion ion implantation. By considering the effects of secondary electron emission from the dielectric substrate and using finite difference schemes, evolution of plasma sheath, ion fluence and dielectric surface potential versus time and substrate thickness are evaluated. It was demonstrated that with the increasing dielectric thickness, sheath width and ion fluence over the dielectric surface decrease and surface potential reduces. These effects can be attributed to the accumulation of positive ions and ejection of secondary electrons from the dielectric surface and thereby lessening the strength of the electric field over the dielectric substrate. It is also shown that the secondary electrons have a profound effect on implantation results and must be considered in plasma immersion ion implantation of dielectric materials.