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Abstract
Properties (crystallographer, mechanical and anti-corrosion) of deposited chromium nitride thin films on Silicon (100) and stainless steel (SS 304) substrates, in a direct current (DC) magnetron sputtering without annealing the substrates; have been investigated as a function of working pressure. It was observed that pressure increase induced crystallization enhancement, thickness decrease, and grain size increase and micro-hardness decrease. The corrosion resistance of the films, using the electrochemical impedance spectroscopy (EIS) technique in the water solution at 50 °C, was found to decrease with pressure increase, where the film deposited at 4 mTorr, having the highest micro-hardness, showed the best corrosion behavior. The surface morphology was investigated by optical microscope before and after the corrosion.
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