Abstract

Recently bifacial n-type passivated emitter and rear totally diffused (PERT) monocrystalline silicon solar cells have become one hot spot in photovoltaic (PV) industries, due to good bifaciality, high and stabilised conversion efficiency. Unlike passivated emitter and rear contacts (PERC) structure, n-PERT solar cells require the use of a thin and uniform back surface field (BSF) layer, usually achieved by phosphorus doping. In this study, we optimised the phosphorus diffusion process in terms of surface concentration, junction depth and carrier lifetime. The effects of different phosphorus BSF were investigated by fabricating n-type front and back contact (nFAB) PERT solar cells using industrial feasible approaches and M2 size Czochralski (Cz) monocrystalline Si wafers (6 in., 244.32 cm2). Good phosphorus profiles were developed, which gives low parasitic absorption, low contact resistance and low J0 value when passivated with silicon nitride (SiNx) layer. The optimised champion cell shows a high Voc of 666.5 mV, Jsc of 40.2 mA/cm2, fill factor of 79.9%, efficiency of 21.43% from front side-illumination, together with a good bifaciality factor of 93.0%.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call