Abstract
Hafnium is a superconductor with a transition temperature slightly above 100 mK. This makes it attractive for such applications as microcalorimeters with high energy resolution. We report the superconducting properties of Hf films of thicknesses ranging from 60 to 115 nm, deposited on Si and Al2O3 substrates by electron beam evaporation. Besides that, we fabricated and measured combinations of hafnium with thin layers of normal metals, decreasing the critical temperature by the proximity effect. The critical temperature of the studied films varied from 56 to 302 mK. We have observed a significant change in the critical temperature of some films over time, which we propose to prevent by covering hafnium films with a thin layer of titanium.
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