Abstract
AlMgB14 coatings have been deposited by DC magnetron sputtering from elemental targets on Si (001), Al2O3 (0001) and MgO (001) substrates at temperatures in the range of 25–350 °C. The structural and mechanical properties of AlMgB14 films were characterized by X-ray diffraction, scanning electron microscopy, nanoindentation, and analyzed as a function of deposition conditions and substrate materials. The results show that all films are X-ray amorphous, and the mechanical properties of the deposited films depend on the substrate and growth temperature. AlMgB14 thin films deposited at 350 °C are found to have smoother surfaces and containing more well-formed B12 icosahedra than the films deposited at lower temperature, which consequently increase the hardness of the deposited films. The maximum hardness and Young’s modulus of the as-deposited films are about 32.3 GPa and 310 GPa, respectively, for films deposited on Al2O3 substrate at 350 °C.
Highlights
IntroductionThe crystal structures of many highboron-content compounds contain B12 icosahedra based on 12-atom clusters in which atoms occupy the 12 vertices of an icosahedron [1]
Boron-rich solids are materials with boron as their primary atomic component
The elemental composition of A lMgB14 thin films was characterized by X-ray photoelectron spectroscopy (XPS)
Summary
The crystal structures of many highboron-content compounds contain B12 icosahedra based on 12-atom clusters in which atoms occupy the 12 vertices of an icosahedron [1]. These dense B networks with unusual bonding generates interesting mechanical and transport properties. The ternary boride A lMgB14 is one of the promising boron-rich boride materials that can form icosahedral structures and has been investigated intensively during last years. This material is attractive due to high
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