Abstract
In this letter, film growth for amorphous Nb/Si multilayers has been studied by using x-ray diffraction (XRD) and cross-sectional transmission electron microscopy (XTEM). Results from XRD and XTEM show that the structures of amorphous Nb/Si multilayers deposited at room temperature and 550 °C are quite different. The influences of surface mobility of adatoms and interfacial reaction on interfacial roughness are discussed.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
