Abstract
This paper deals with the reconstruction of concentration depth profiles by means of angle resolved X-ray photoelectron spectrometry. A polynomial model is introduced which describes the concentration distribution c i ( x) of the element i as a polynomial of third order within the range 0 ⩽ x ⩽ x m; x gives the sample depth measured from the surface. The further constraints c i ( x m) = b i (with b i as the bulk concentration of the element i) and d c i ( x)/d x = 0 for x = x m reduce the number of unknown parameters to two per element with the additional parameter x m and the unknown photon flux. By means of computer simulation it can be shown that the results of the reconstructed depth profiles are stable and not very sensitive to statistical errors of measured count rates. Experimentally measured count rates of an Al-Li alloy before and after segregation were evaluated. The calculation time per depth profile was approximately 10 min.
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