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Abstract
Higher actuator voltages are required for future generation lithography machines to increase productivity. The operating pressures in combination with relevant insulation distances, can be situated near gas breakdown and cause partial discharge activity, making long-term damage conceivable. High voltage cone-shape connectors with pliable insulation can be applied for the low and medium vacuum range. However, materials and space are restricted making a cone shaped connector not ideal. In this paper, a flat connector concept is presented with a pliable insulation material allowed to be used for the aforementioned application. The permittivity of this material is measured and simulation results of the connector reveal critical design points. A prototype connector is made and its partial discharge inception voltage is characterized for the low and medium vacuum range. The results are discussed and compared with simulations.
Highlights
Future generation lithography machines require a significant increase in actuation power of the moving stages, in order to ensure the continuous demand for improved productivity
The partial discharge inception voltage (PDIV) of the prototype connector is measured in argon and nitrogen gas
The PDIV of the realized connector is measured as function of pressure and compared with prior simulation results
Summary
Future generation lithography machines require a significant increase in actuation power of the moving stages, in order to ensure the continuous demand for improved productivity. When voltages are limited to approximately 300 V, void containing connectors with sliding contact can be used without expecting lifetime issues [5,6] This is because the voltage over the voids are below Paschen minimum breakdown voltage [3,4] and no PDs are expected [7]. The partial discharge inception voltage (PDIV) of the prototype connector is measured in argon and nitrogen gas These results are compared with ‘scaled Paschen curves’ [7] based on electrostatic voltage simulations. It is investigated whether prior PDs, influence the subsequent PDIV of the connector
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