Abstract
Considering the future importance of unconventional energy sources, improving the efficiency of photovoltaic devices is vital. This study investigates the effect of different cross-sectional nanogratings on reflectivity of silicon surface. The nanostructures dimesions were optimized thorugh simulation and further validated using spectrophotometer. Electron Beam Lithography and Reactive Ion Etching techniques were used to fabricate nanogratings on silicon surface and characterized to confirm dimensions. The fabricated rectangular nanogratings on silicon surface helps to reduce the reflectance by 31.44% owing to the gradual change in refractive index of the surface.
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