Abstract
The inhibitive effect of copper in 0.5 mol/L H2SO4 by Davidia involucrata leaf extract (DLE) as inhibitor was investigated by means of experimental and theoretical methods. The maximun inhibition efficiency (η) acquired by electrochemical measurements are found to be close to 90% at different temperatures. The bonding information are detected by Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). The scanning electron microscopy (SEM) and atomic force microscopy (AFM) observations illustrate DLE can protect copper by forming an effective film. Also, Langmuir adsorption model is the most suitable to illustrate the adsorption mechanism of DLE on copper surface. The adsorption mechanism is further explained through quantum chemical calculation and molecular dynamics simulation.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
