Investigating antireflection properties of hybrid silicon nanostructures comprising rod-like nanopores and nano-textured surface

Abstract

In the present work, we have fabricated hybrid silicon (Si) nanostructures comprising vertical rod-like nanopores and nano-textured surface by metal assisted chemical etching (MACE) method at room temperature. The as-received p-type Upgraded Metallurgical grade (UMG) Si wafers were chemical polished, prior to investigating the etching effects at the metal nanoparticle semiconductor interface. The influence of metal silver nanoparticle (AgNPs) concentration on the formation of hybrid nanostructures were studied systematically. Depending on the surface morphology, the hybrid structures exhibited constant 10% average reflectance in the UV–Visible spectral region or average 7.5% reflectance in range of 200–400 nm.