Abstract

Abstract Single and stacked Nb/Al-AlNx/Nb superconducting tunnel junctions with both hysteretic (underdamped) and non-hysteretic (overdamped) current-voltage relationships have been produced utilizing reactively sputtered aluminum nitride tunnel barriers. Standard multilayer deposition and lithographic processing techniques, compatible with existing Nb/Al-AlOx/Nb fabrication techniques, are used in fabrication. The degree of damping in the junctions is controlled through the deposition parameters. Critical current dependence on applied magnetic field indicates that the overdamped junctions have a distributed Josephson coupling and are not simple microshorts. The shorter deposition time to grow reactively sputtered AlNx barriers makes this system a promising alternative to fabricate stacked Josephson junctions.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.