Intermetallic compound and Kirkendall void growth in Cu pillar bump during annealing and current stressing

Abstract

Cu pillar bump with eutectic SnPb was annealed and the microstructures were observed by scanning electron microscopy. Both of Cu <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">6</inf> Sn <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">5</inf> and Cu <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> Sn grew following parabolic rate law at 120 and 150°C. At 165°C, Cu <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">6</inf> Sn <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">5</inf> growth was stagnated while Cu <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> Sn growth rate was increased after 160 hour when all Sn was consumed. Kirkendall void was formed because of different diffusivities of Cu and Sn. The activation energies of Cu <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">6</inf> Sn <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">5</inf> , Cu <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> Sn, and Kirkendall void growth were 1.77, 0.72, and 0.36 eV respectively. Intermetallic compound (IMC) growths during 150°C annealing and in current stressing condition were observed to investigate the effect of current stressing. In current stressing condition, the temperature was 150°C and the current density was 5 × 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">4</sup> A/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> . IMC growth in current stressing condition was faster than that during annealing because of electron wind force.