Abstract
H-kenyaite was modified by interlayer surface silylation using 3-aminopropyltriethoxysilane and dodecylamine in ethanol without a pre-swelling step. Dodecylamine acts as a gallery expander and silylation catalyst. The evaporation of ethanol from the dispersion yields well-ordered silylated kenyaites with large basal spacings between 4.12 and 5.12 nm. Solid-state 29Si MAS NMR of the silylated samples showed Q 3 and Q 4 signals as well as T 2 and T 3 signals. The increase in the relative intensity of Q 4 for Q 3 and the appearance of T 2 and T 3 signals was attributed to the grafting of 3-aminopropyltriethoxysilane to the interlayer surface silanol groups.
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