Abstract
We present numerical analysis of interferometric patterns formed by multiple sources. Multiple beams can be achieved either from a synchronized laser array or by splitting a coherent light source. We assume Gaussian form for each beam, and all the beams are combined at the near field. The condition for achieving periodic structures with the feature size significantly smaller than λ/4 is obtained. Multiple beam interference has the potential of achieving smaller feature size, less power requirement, and more flexibility than the conventional two-beam interferometric lithography method.
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Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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