Abstract
Two sample groups, N5/(ZrB2+ZrO2)/NiCrAl and N5/ZrO2/NiCrAl, were prepared on Ni-based single crystal alloy (Rene N5) substrate by electron beam physical vapor deposition (EB-PVD). Both sample groups were exposed to isothermal oxidation at 900 °C for 5 h and at 1000 °C, for 250 h, 300 h or 350 h. The microstructural evolution and deterioration failure behavior was investigated by scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS). The results suggest that the introduction of ZrB2 decelerates the interfacial reaction rate of the active diffusion barrier of Al2O3 but does not affect the final formation of the Al2O3 diffusion barrier with anti-diffusion properties. Moreover, the introduction of ZrB2 prolongs the service life of active diffusion barrier structure and changes its failure mode.
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