Abstract
The principles of ellipsometric measurements, their relationship to reflectance and Raman scattering, the reasons for their sensitivity to monolayer films, and the meaning and modeling of the optical response of thin films are discussed in qualitative terms. Methods for reducing ellipsometric data, including recently developed multilayer analysis techniques and combined ellipsometry/reflectance measurements, are also discussed. Several examples of the analysis of solid-electrolyte interfaces, taken from the Fourth International Ellipsometry Conference, illustrate the capabilities of these techniques.
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