Abstract

This paper outlines the use of an InGaAs/InP channel allows to reduce drastically impact ionisation effects and consequently output conductance of the device: 85 mS/mm for a composite channel compared to 145 mS/mm for the conventional channel. Using a composite channel, device transconductance is enhanced from 1 S/mm to 1.2 S/mm and cut-off frequency F/sub MAX/ increases by 50%. Thus a 0.15 /spl mu/m gate length InGaAs/lnP composite channel HEMT shows a current gain cut-off frequency F/sub T/ of 151 GHz and a maximum unilateral gain cut-off frequency F/sub MAX/ of 225 GHz. The comparison of passivated and non-passivated devices highlights the influence of the feedback capacitance on RF performance. 0.15 /spl mu/m gate length InGaAs/InP/InP n+ composite channel HEMTs have also been fabricated. Devices exhibit state of the art performance at 60 GHz, with an output power density of 350 mW/mm, 12% power-added-efficiency (PAE) and 6.2 dB of linear gain.

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