Abstract
Abstract The room-temperature kinetics of oxygen accumulation on the sputter-cleaned U-0.1wt%Cr alloy surface were followed by combined measurements utilizing Auger electron spectroscopy (AES) and direct recoil spectrometry (DRS). The similarity between the coverage versus exposure curves as obtained by the two techniques point to the mechanism of island growth spreading over the surface. At about 20 L exposure a complete coverage of the surface is attained and a protective layer with a depth of about 15 A (as obtained from XPS) is formed.
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