Abstract
The kinetics of accumulation of hydrogen on clean and on oxidized uranium surfaces was studied by combined direct recoil spectrometry (DRS), Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) techniques. For the sputter-cleaned surface an island growth progression characterizes the accumulation kinetics of hydrogen, whereas on the oxidized surface a random two-site Langmuir model seems to fit the initial chemisorption process. Similar combined DRS and AES measurements were applied to study the kinetics of accumulation of oxygen on H 2 predosed uranium as compared to the clean (H-free) case. The pre-chemisorption of hydrogen modifies the mechanism of oxygen incorporation and the structure of the product overlayer.
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