Abstract
Interaction of iron atoms with the Si(100)-2 × 1 surface at room temperature is studied by core-level photoelectron spectroscopy using synchrotron radiation for Fe coverages ranging from a fraction of a monolayer to six monolayers. It is shown that the Fe/Si(100)-2 × 1 interface is chemically active: the Fe-Si solid solution forms early in deposition of iron on silicon. When the Fe coverage reaches four to five monolayers, the state of the system is changed and Fe3Si silicide arises.
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