Interaction of bulk nickel and nichrome with halogenated butanes

Abstract

Catalytic chemical vapor deposition of halogenated butanes over bulk nickel-containing samples was studied. Butyl iodide and butyl bromide were used as substrates containing both hydrogen and halogen molecules. The experiments were performed in a flow reactor system as well as reaction under autogenic pressure at elevated temperature conditions. Scanning and transmission electron microscopies and ferromagnetic resonance spectroscopy were applied to examine the samples. The formation of structured particles of micron size was observed when nickel ribbon or nichrome wire was used as a bulk sample. The intermediates were shown to be stable in a narrow temperature range. The morphology of the resulting microcrystals was different depending on the metal precursor.