Integrated silicon metasurface polarization beam splitter on a standard SOI substrate

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Polarization beam splitters are indispensable components in on-chip polarization-division-multiplexing systems. We propose a compact integrated polarization beam splitter based on a metasurface structure with a 300 nm periodic silicon column array with a variable duty cycle on a silicon-on-insulator substrate. Simulation results indicate a low insertion loss, high extinction ratio, and a 6×12 μm2 footprint within the C+L band. The robustness of our device with respect to manufacturing tolerance and nonideal input light has also been confirmed. The proposed polarization beam splitter can be fabricated in a single lithography step with input/output waveguides, which will be advantageous for device fabrication.