Abstract
Abstract The critical requirements for thin film dielectric materials (ferroelectric and/or paraelectric) in niche technological areas (i.e., non-volatile memories, ULSI DRAMS and decoupling capacitors) are first considered. Next, the rationale for the need of epitaxial single crystal Pb-based ferroelectric perovskite thin films to address key scientific issues is outlined. These topics are followed by discussions on the recent progress (in our labortory) and future prospects on the chemical processing and properties of Pb-perovskite thin films. Finally, some thoughts on Professor Von Hippel's philosophy that will lead the field to advances into the threshold of the 21st century are echoed.
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