Integrated micromachined magnetic field sensor with on-chip support circuitry

Abstract

This letter presents an integrated magnetic field sensor that has been fabricated in a standard complementary metal-oxide semiconductor process. Along with the sensor, on-chip circuitry has been realized to amplify the resulting Hall voltage signal. Furthermore, to increase device sensitivity, the sensor has been subjected to a post-process etching step. The integrated sensor exhibits a ten times higher output signal compared with the output signal of the sensor alone.