Abstract
The following paper describes an in-situ approach to studies of hot filament chemical vapour deposition (HFCVD) thin film growth. It based on the use of a HFCVD experimental setup in the chamber of an environmental scanning electron microscope (ESEM). The initial stages of diamond thin film growth were examined at time intervals 15, 30, and 60 min in one deposition process. Characterisation of the deposited particles by transmission electron microscopy (TEM) and electron diffraction confirmed the presence of the diamond structure. The influence of the pressure limiting aperture (PLA) and the electron beam on the diamond deposition process and the advantages, limitations, and further development of the techniques employed are discussed.
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