Abstract
A vacuum deposition method for producing SiOx〈Fe〉 composite metal-dielectric films in which the metal concentration in the SiOx dielectric matrix varies across thickness is described. The reflection and transmission of the films in the 2–12 µm IR spectral range are studied and their optical properties are simulated. In the temperature range 283–390 K, the temperature-sensitive properties of the SiOx〈Fe〉 films with a phase volume ratio of 23% (Fe): 77% (SiO) is investigated. For these films, the temperature coefficient of resistance is found. The feasibility of these films as a sensitive layer in microbolometers is demonstrated.
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