Abstract
The paper presents a technological study for the realization of micromirrors which have both, a large pixel size (100 /spl mu/m/spl times/100 /spl mu/m) and a large mirror deflection angle (/spl plusmn/15/spl deg/). This specification requires a 13 /spl mu/m gap for electrostatic actuation. A metal surface micromachining process has been developed using thick resist UV-lithography, multiple electroplating, a copper sacrificial layer and a polishing process step. Using nonplanar electrodes the driving voltage of electrostatic actuators can be reduced by factors. Two different technologies to realize tapered electrodes are presented.
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