Abstract
A two-step seed-overlay chemical vapour deposition synthesis to tune morphology for highly rough, low haze FTO TCO thin films.
Highlights
Transparent conducting oxides (TCO) are thin film materials that are simultaneously optically transparent and appreciably electrically conductive
atmospheric pressure CVD (APCVD) involves the use of discrete chemical precursors, the concentration of which is controlled by gas flows prior to mixing and the subsequent deposition for film formation, to control functional properties.[30]
The work presented in this paper explores fluorine doped tin oxide (FTO) synthesis by the AA-AP chemical vapour deposition (CVD) seed-overlay method
Summary
Transparent conducting oxides (TCO) are thin film materials that are simultaneously optically transparent and appreciably electrically conductive. The production of fluorine-doped SnO2 (FTO) – one of the worlds most widely used and produced TCO – and other conventional TCO is frequently carried out by atmospheric-pressure chemical vapour deposition (APCVD), most notably by Pilkington-NSG for their TEC glass range.[27,28,29] APCVD involves the use of discrete chemical precursors, the concentration of which is controlled by gas flows prior to mixing and the subsequent deposition for film formation, to control functional properties.[30] whilst optimised electrical conductivity and optical transmittance TCO values can be achieved using this high-throughput deposition method, control of microstructure, the various morphologies afforded by techniques such as aerosol-assisted CVD (AACVD), cannot be reproduced due to the lack of growth control on the amorphous glass substrate.
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