Influences of the substrate temperature on the films plasma-polymerized at the low system pressure

Abstract

Influences of the substrate temperature and the system pressure on the plasma polymerization were investigated from a viewpoint of the chemical composition of the deposited polymers. Both parameters influenced the plasma polymerization of tetrafluoroethylene (TFE). The deposition at the high substrate temperature as well as at the low system pressure led to the formation of plasma polymers being poor in fluorine moieties. This result indicates that the chemical composition of the deposited plasma polymers may be determined by interactions of activated molecules with substrate surfaces.