Abstract

PurposeThis study aims to investigate the effect of V doping on the microstructure, chemical stability, mechanical and vacuum tribological behavior of sputtered MoS2 coatings.Design/methodology/approachThe MoS2-V coatings are fabricated via tuning V target current by magnetron sputtering technique. The structural characteristic and elemental content of the coatings are measured by field emission scanning electron microscopy, X-ray diffractometer, electron probe X-ray micro-analyzer, Raman, X-ray photoelectron spectroscopy, high resolution transmission electron microscope and energy dispersive spectrometer. The hardness of the deposited coatings are tested by a nanoindentation technique. The vacuum tribological properties of MoS2-V coatings are studied by a ball-on-disc tribometer.FindingsIntroducing V into the MoS2 coatings results in a more compact microstructure. The hardness of the coatings increases with the doping of V. The MoS2-V coating deposited at a current of 0.2 A obtains the lowest friction coefficient (0.043) under vacuum. As the amount of V doping increases, the wear rate of the coating decreases first and then increases, among which the coating deposited at a current of 0.5 A has the lowest wear rate of 2.2 × 10–6 mm3/N·m.Originality/valueThis work elucidates the role of V doping on the lubrication mechanism of MoS2 coatings in a vacuum environment, and the MoS2-V coating is expected to be applied as a solid lubricant in space environment.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.